IIT Delhi to Start Programme in December to Bolster India Semiconductor Mission, Empower Workforce – News18

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The core objectives of the programme revolve around equipping participants with an understanding of device design, Metal Oxide Semiconductor device fabrication, and clean room protocols. (Photo: Reuters File)

The core objectives of the programme revolve around equipping participants with an understanding of device design, Metal Oxide Semiconductor device fabrication, and clean room protocols. (Photo: Reuters File)

The semiconductor-specific programme is accessible to individuals with B. Tech, M. Sc, M. Tech, PhD, and PDF qualifications, as well as scientists and faculty affiliated with AICTE-approved institutions and national laboratories

The Indian Institute of Technology (IIT)-Delhi is all set to host an intensive ‘Semiconductor Device Technology: Fabrication and Characterisation’ training programme from December 18 to 22 to support the India Semiconductor Mission (ISM), dedicated to fostering a skilled workforce.

Designed as a part of the Continuing Education Programme (CEP) and conducted at the Nanoscale Research Facility (NRF), IIT Delhi, the hands-on course will immerse participants in the intricacies of microelectronic device design, fabrication techniques, and the exploration of current and future applications across diverse sectors.

The NRF at IIT Delhi stands as a hub for cutting-edge research in Nanoscience and Nanotechnology, boasting state-of-the-art clean rooms and advanced fabrication instruments. Additionally, IIT Delhi’s CEP has expanded its outreach through certificate programs, ensuring accessibility to quality education across various domains.

The core objectives of the announced programme revolve around equipping participants with a comprehensive understanding of device design, Metal Oxide Semiconductor (MOS) device fabrication, and clean room protocols. It further stresses the importance of precise measurements and parameter extraction techniques vital for fabricated devices.

In terms of eligibility, this semiconductor-specific programme is accessible to individuals with B. Tech, M.Sc, M.Tech, PhD, and PDF qualifications, as well as scientists and faculty affiliated with AICTE-approved institutions and national laboratories. However, with limited slots for 30 participants available on a first come first served basis, interested individuals are encouraged to register before the December 1 deadline.

Led by experts from IIT Delhi’s renowned research departments including the Centre for Applied Research in Electronics, Physics, and Electrical Engineering, the programme spans a comprehensive curriculum. From silicon wafer processing to future perspectives in Microelectronics devices, the sessions are crafted to offer a holistic understanding of semiconductor technology.

Certificates will be awarded upon meeting the minimum evaluation criteria and maintaining consistent attendance throughout the programme The NRF serves as the organising department and certificates will be issued in an e-format by CEP, IIT Delhi.

This news comes at a time when the US company Micron, which began work in Gujarat’s Sanand to make an Assembly, Testing, Marking and Packaging (ATMP) plant, has made its first round of recruitments from local campuses, with around 30 students receiving job offers or internship-cum-employment opportunities at the firm.

However, it should be noted that there is a dire need for a skilled workforce in the semiconductor industry. The industry is rapidly growing and becoming increasingly complex, and there is a shortage of workers with the skills and knowledge to keep up with demand. In India, with the government anticipating further positive developments in the semiconductor industry, initiatives like IIT Delhi would contribute to laying the groundwork at the grassroots level.

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